| Invention Title |
Inventor Name(s) |
|
"Sweet" PAGs - Environmentally Friendly Photoacid Generators based on Saccharide |
Christopher Ober,
Yi Yi
|
|
Adamantane Based Molecular Glass Resist for 193 nm Lithography |
Christopher Ober,
Shinji Tanaka
|
|
Additives for Improving Polymer Surface Properties |
Lynden Archer,
Zhenyu Qian
|
|
Bilayer Resist and Process for Preparing Same |
Christopher Ober,
Allen Gabor
|
|
Branched Microstructures with Reactive Endgroups to promote Thin Film Deposition |
James Engstrom,
Abhishek Dube,
Manish Sharma
|
|
Environmentally Friendly Photoacid Generators (PAGs) |
Christopher Ober,
Ramakrishnan Ayothi,
Kyung-Min Kim,
Xiang Qian Liu
|
|
Fluorinated Polymers for Providing a Surface Coating with Stable Low Surface Energy Properties |
Christopher Ober,
Edward Kramer
|
|
NIMs - Nanoparticle based Ionic Materials; Liquefied Nanostructures |
Emmanuel Giannelis,
Athanasios Bourlinos
|
|
Organoelement Resists for EUV Lithography |
Christopher Ober,
Franco Cerrina,
Junyan Dai,
Paul Nealey,
Lin Wang
|
|
Orthogonal Processing of Organic Semiconductors |
Christopher Ober,
Margarita Chatzichristidi,
Jin-Kyun Lee,
George Malliaras,
Priscilla Taylor,
Alexander Zakhidov
|
|
Orthogonally Processible Acid-stable Imaging Material for Lithographic Patterning of Organic Electonic Materials (Combined with D-4385) |
Christopher Ober,
Jin-Kyun Lee,
George Malliaras,
Priscilla Taylor
|
|
Photoacid Generators Based on Novel Fluorinated Groups |
Christopher Ober,
Ramakrishnan Ayothi,
Yi Yi
|
|
Polymer Material with Stable Non-Wetting Surface |
Christopher Ober,
Kenneth Wynne,
Maoliang Xiang
|
|
Polymer Nanofiber Production |
Harold Craighead,
Jun Kameoka,
Keiyo Nakano
|
|
Protective Polymer Thin Film Coating with Self Cleaning Surface |
Christopher Ober,
Edward Kramer,
Sitaraman Krishnan,
Qin Lin
|
|
Self-Assembled Monolayers Having Inorganic-Organic Interfaces |
James Engstrom,
Andrew Chadeayne,
Abhishek Dube,
Aravind Killampalli,
Paul Ma,
Manish Sharma,
Peter Wolczanski
|
|
Using Block Copolymers as Supercritical CO2 Developable Photoresists |
Christopher Ober,
Kenji Ogino,
N. Sudararajan,
S. Valiyaveettil,
Jianguo Wang
|
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